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General Information
    • ISSN: 2010-3751
    • Frequency: Bimonthly (2012-2016); Quarterly (Since 2017)
    • DOI: 10.18178/IJFCC
    • Editor-in-Chief: Prof. Mohamed Othman
    • Executive Editor: Ms. Nancy Y. Liu
    • Abstracting/ Indexing: Google Scholar, Engineering & Technology Digital Library, and Crossref, DOAJ, Electronic Journals LibraryEI (INSPEC, IET).
    • E-mail:  ijfcc@ejournal.net 
Prof. Mohamed Othman
Department of Communication Technology and Network Universiti Putra Malaysia, Malaysia
It is my honor to be the editor-in-chief of IJFCC. The journal publishes good papers in the field of future computer and communication. Hopefully, IJFCC will become a recognized journal among the readers in the filed of future computer and communication.
IJFCC 2013 Vol.2(2): 90-95 ISSN: 2010-3751
DOI: 10.7763/IJFCC.2013.V2.128

Topological Properties of few Poly Oxide, Poly Silicate, DOX and DSL Networks

F. Simonraj and A. George

Abstract—This paper deals with a new interconnection network motivated by molecular structure of a chemical compound SiO4. The different forms of silicate available in nature lead to the introduction of the (DSL) dominating silicate network. The first section deals with the introduction to (Resolving number) minimum metric dimension problems, and few related work about Silicate networks. The second section introduces and gives an account of the proof to the topological properties of poly-oxide, poly-silicate, dominating oxide (DOX), dominating silicate networks, and regular triangulene oxide network (RTOX). The third section deals with the drawing algorithm for dominating silicate network, and shown complete embedding of oxide, silicate network in to dominating oxide, dominating Silicate network respectively. The fourth section contains the proof of the minimum metric dimension of regular triangulene oxide network to be 2.

Index Terms—Dominating oxide, dominating silicate, embedding, minimum metric dimension, mesh like architectures, poly-oxide, poly-silicate networks, topological properties.

The authors are with the Department of Mathematics, Hindustan Institute of Technology and Science, Chennai, India, 603103 (e-mail: simonr@ hindustanuniv.ac.in, ageorge@ hindustanuniv.ac.in)


Cite: F. Simonraj and A. George, "Topological Properties of few Poly Oxide, Poly Silicate, DOX and DSL Networks," International Journal of Future Computer and Communication vol. 2, no. 2 pp. 90-95, 2013.

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